Plasma treatment helps reveal how molecular coatings dope silicon

Дата публикации: 28-09-2026 23:20:04

Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to tune the amount of dopant available at the silicon surface before thermal diffusion.

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